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Modelling of Residual Stresses by Photoelastic Method during the Coating Deposition 

Kõo, Jakub; Lille, Harri; Valgur, Jaak; Idnurm, Siim (DGM Informationsgesellschaft, 1993)
A calculating scheme according to which the process of material growth is regarded as a continuous growth of the equidistant to interface elementray layers with initial stresses is widely used for determination of residual ...

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Idnurm, Siim (1)
Kõo, Jakub (1)
Lille, Harri (1)
Valgur, Jaak (1)Subject
articles (1)
coatings (1)
finite element analysis (1)
photoelastic method (1)
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DSpace software copyright © 2002-2016  DuraSpace
All items in EMU digital archive DSpace are protected by original copyright, with all rights reserved, unless otherwise indicated.
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